Physical origin of the gate current surge during short-circuit operation of SiC MOSFET - LAAS - Laboratoire d'Analyse et d'Architecture des Systèmes
Article Dans Une Revue IEEE Electron Device Letters Année : 2019

Physical origin of the gate current surge during short-circuit operation of SiC MOSFET

Résumé

During short-circuit of a vertical 4H-SiC power MOSFET, a high gate current starts to flow through the gate dielectric. We demonstrate that the Schottky emission is the main physical mechanisms.
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Dates et versions

hal-02020275 , version 1 (27-02-2019)

Identifiants

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François Boige, David Trémouilles, Frédéric Richardeau. Physical origin of the gate current surge during short-circuit operation of SiC MOSFET. IEEE Electron Device Letters, 2019, 40 (5), pp.666-669. ⟨10.1109/led.2019.2896939⟩. ⟨hal-02020275⟩
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