Laser annealing processes in semiconductor technology - LAAS - Laboratoire d'Analyse et d'Architecture des Systèmes
Ouvrage (Y Compris Édition Critique Et Traduction) Année : 2021

Laser annealing processes in semiconductor technology

Résumé

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering.
Fichier non déposé

Dates et versions

hal-03341138 , version 1 (10-09-2021)

Identifiants

  • HAL Id : hal-03341138 , version 1

Citer

Fuccio Cristiano, Antonino La Magna (Dir.). Laser annealing processes in semiconductor technology. Elsevier, 426p., 2021, 9780128202555. ⟨hal-03341138⟩
266 Consultations
0 Téléchargements

Partager

More