@inproceedings{isoird:hal-03766749, TITLE = {{Locally Ion Implantation and Annealing Effects in Diamond}}, AUTHOR = {Isoird, Karine and Tasselli, Josiane and Spiegel, Yohann and Gourad, Raid. and Cristiano, Fuccio and Pinault-Thaury, Marie-Amandine. and Grosset, Gregory and Gilet, R{\'e}m and Jomard, Fran{\c c}oi}, URL = {https://laas.hal.science/hal-03766749}, BOOKTITLE = {{E-MRS 2022 Fall Meeting.}}, ADDRESS = {Warsaw, Poland}, HAL_LOCAL_REFERENCE = {Rapport LAAS n{\textdegree} 22356}, YEAR = {2022}, MONTH = Sep, KEYWORDS = {Ion implantation ; Plasma immersion ion implantation ; Diamond ; Power devices ; high temperature annealing ; capping layer}, HAL_ID = {hal-03766749}, HAL_VERSION = {v1}, }