Technology transfer of supercritical fluid deposition technology from research group to use in open nanotechnology facilities
Résumé
Due to the high integration, the plating of thin films on microstructures is becoming more important. However, deposition in microstructured trenches is difficult using conventional methods such as CVD and PVD. ALD has become popular but its drawback is slow deposition rate. To fulfil both coverage and speed, we focused on a supercritical deposition (SCFD) technique. In UTokyo, the technology was first investigated in a research laboratory (Shimogaki-Momose lab.) [1], and transferred to our nanotechnology facility. During the technology transfer, deposition conditions and cleaning procedure was developed [2] [3].
Domaines
Sciences de l'ingénieur [physics]Origine | Fichiers produits par l'(les) auteur(s) |
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