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authFullName_s : Richard Daubriac
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Structural and Electrical Characterizations of BiSb Topological Insulator Layers Epitaxially Integrated on GaAs

Dima Sadek , Richard Daubriac , Corentin Durand , Richard Monflier , Quentin Gravelier , et al.
Crystal Growth & Design, 2022, 22 (8), pp.5081-5091. ⟨10.1021/acs.cgd.2c00585⟩
Journal articles hal-03775836v1
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Failure Mode Analysis in Microsecond UV Laser Annealing of Cu Thin Films

Rémi Demoulin , Richard Daubriac , Louis Thuries , Emmanuel Scheid , Fabien Rozé , et al.
IEEE International Interconnect Technology Conference (IITC) 2022, Jun 2022, San José, California, United States. ⟨10.1109/iitc52079.2022.9881308⟩
Conference papers hal-03795894v1

High performance CMOS FDSOI devices activated at low temperature

L. Pasini , P. Batude , J. Lacord , M. Cassé , B. Mathieu , et al.
2016 IEEE Symposium on VLSI Technology, Jun 2016, Honolulu, United States. ⟨10.1109/VLSIT.2016.7573407⟩
Conference papers hal-01730659v1

Stress relaxation and dopant activation in nsec laser annealed SiGe

Fuccio Cristiano , Richard Monflier , Richard Daubriac , Rémi Demoulin , Emmanuel Scheid , et al.
IWJT - International Workshop on Junction Technology, Jun 2021, Kyoto (on line), Japan. ⟨10.23919/IWJT52818.2021.9609361⟩
Conference papers hal-03449341v1

Differential hall characterization of shallow strained SiGe layers

Richard Daubriac , Mahmoud Abou Daher , Emmanuel Scheid , Fuccio Cristiano , S. Joblot , et al.
2016 IEEE Nanotechnology Materials and Devices Conference (NMDC), Oct 2016, Toulouse, France. ⟨10.1109/NMDC.2016.7777082⟩
Conference papers hal-01730652v1
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A Differential Hall Effect method with sub-nanometre resolution for active dopant concentration profiling in ultra-thin Si 1-x Ge x and Si doped layers

Richard Daubriac , Emmanuel Scheid , S. Joblot , R. Beneyton , P Acosta Alba , et al.
2018
Preprints, Working Papers, ... hal-01730674v1
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Dopant Activation in Ultra-thin SiGeOI and SOI layers characterised by Differential Hall Effect

Richard Daubriac , Emmanuel Scheid , S. Joblot , R. Beneyton , P Acosta Alba , et al.
Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, Mar 2018, Grenade, Spain
Conference papers hal-01735436v1
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A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si 1− x Ge x and Si layers

Richard Daubriac , Emmanuel Scheid , Hiba Rizk , Richard Monflier , Sylvain Joblot , et al.
Beilstein Journal of Nanotechnology, 2018, 9, pp.1926 - 1939. ⟨10.3762/bjnano.9.184⟩
Journal articles hal-01921179v1
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Caractérisation de techniques d'implantations ioniques alternatives pour l'optimisation du module source-drain de la technologie FDSOI 28nm

Richard Daubriac
Micro et nanotechnologies/Microélectronique. INSA de Toulouse, 2018. Français. ⟨NNT : 2018ISAT0031⟩
Theses tel-02087031v2