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authFullName_s : S Kerdilès
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Study of recrystallization and activation processes in thin and highly doped Silicon-On-Insulator layers by nanosecond Laser Thermal Annealing

N Chery , M Zhang , Richard Monflier , N. Mallet , G Seine , et al.
Journal of Applied Physics, 2022, 131 (6), pp.065301
Journal articles hal-03454821v2

Stress relaxation and dopant activation in nsec laser annealed SiGe

Fuccio Cristiano , Richard Monflier , Richard Daubriac , Rémi Demoulin , Emmanuel Scheid , et al.
IWJT - International Workshop on Junction Technology, Jun 2021, Kyoto (on line), Japan. ⟨10.23919/IWJT52818.2021.9609361⟩
Conference papers hal-03449341v1
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Defects Investigation in Nanosecond laser Annealed Crystalline Silicon: Identification and Localization

Richard Monflier , Hiba Rizk , Toshiyuki Tabata , Julien Roul , Simona Boninelli , et al.
22nd International Conference on Ion Implantation Technology, Sep 2018, Würzburg, Germany. pp.4, ⟨10.1109/IIT.2018.8807933⟩
Conference papers hal-01803955v2