Methodology for the study of thermal nanoimprint lithography-induced deformation
Méthodologie pour l'étude des déformations induites par nanoimpression thermique
Résumé
Soft Nano-Imprint Lithography is a promising technology for optical devices as it allows quick and low-cost replication of a master mold. We present a methodology to characterize the displacement of replicated patterns caused by shrinkage during soft mold fabrication using thermal nano-imprint lithography. Because of the different heat expansion coefficients between the master mold and the soft mold, the replicated patterns can be distorted. We apply this methodology to two different nanoimprint technologies. Our objective is to create a master mold compensating for the distortions on the soft mold, allowing to use thermal nanoimprint in a mix and match process.
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