Communication Dans Un Congrès Année : 2025

Advantage and Challenge of Electrical Critical Dimension Test Structures for Electroplated High Aspect Ratio Nano Structures (HARNS) on Insulating Materials

Résumé

Electrical Critical Dimension Test Structures (ECD-TS) have been applied for development of new technology: Metallic High Aspect Ratio Nano Structures (Metal- HARNS). The HARNS refer to electro mechanical structures scaled down to submicron width (as narrow as 260nm confirmed) while keeping its thickness (up to 1500nm confirmed). Two major advantage and challenge have been confirmed through measurement: (1) insulating material showed critical advantage on ECD over Scanning Electron Microscope CD assessment and (2) seed conductive layer affected the measurement as leakage path.

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Dates et versions

hal-05208090 , version 1 (12-08-2025)

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  • HAL Id : hal-05208090 , version 1

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Yoshio Mita, Ayako Mizushima, Noriko Kawai, Tsuboi Shinji, Yurie Inoue, et al.. Advantage and Challenge of Electrical Critical Dimension Test Structures for Electroplated High Aspect Ratio Nano Structures (HARNS) on Insulating Materials. ICTMS 2025, IEEE, Mar 2025, Matsue, Japan. ⟨hal-05208090⟩
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