Technology transfer of supercritical fluid deposition technology from research group to use in open nanotechnology facilities - LAAS - Laboratoire d'Analyse et d'Architecture des Systèmes Access content directly
Conference Papers Year : 2023

Technology transfer of supercritical fluid deposition technology from research group to use in open nanotechnology facilities

Abstract

Due to the high integration, the plating of thin films on microstructures is becoming more important. However, deposition in microstructured trenches is difficult using conventional methods such as CVD and PVD. ALD has become popular but its drawback is slow deposition rate. To fulfil both coverage and speed, we focused on a supercritical deposition (SCFD) technique. In UTokyo, the technology was first investigated in a research laboratory (Shimogaki-Momose lab.) [1], and transferred to our nanotechnology facility. During the technology transfer, deposition conditions and cleaning procedure was developed [2] [3].
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Dates and versions

hal-04131030 , version 1 (16-06-2023)

Identifiers

  • HAL Id : hal-04131030 , version 1

Cite

Etsuko Ota, David Bourrier, Naoto Usami, Ayako Mizushima, Naonobu Shimamoto, et al.. Technology transfer of supercritical fluid deposition technology from research group to use in open nanotechnology facilities. ENRIS 2023, Renatech Euronanolab, May 2023, Paris Saclay, France. ⟨hal-04131030⟩
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